Specification | |
Top Functional Layer | |
Diameter | 3, 4, 6 inches |
Orientation | X, Z, Y, etc. |
Material | LiNbO3 |
Thickness | 300-900 nm |
Deep(optional) | MgO |
Isolation Layer | |
Material | SiO2 |
Thickness | 1000-4000nm |
Substrates | |
Material | Si, LN, Quartz, Fused Silica etc. |
Thickness | 400-500nm |
Optional Electrode Layer | |
Material | Pt, Au, Cr |
Thickness | 100-400 nm |
Structure | Above or under SiO2 isolation layer |
Modules or Types:
Single-crystal Lithium Niobate Thin Film |
SiO2 |
LN, Silicon, Quatz or Fused Silica Substrates |
Single-crystal Lithium Niobate Thin Film |
Eletrode |
SiO2 |
Lithium Niobate Substrates |
Single-crystal Lithium Niobate Thin Film |
SiO2 |
Eletrode |
Lithium Niobate Substrates |
Single-crystal MgO-doped LN Thin Film |
SiO2 |
MgO-doped LN Substrates |